再生丝素蛋白膜表面的纳米图案化修饰对细胞黏附和增殖的影响

doi:10.3969/j.issn.0258-8021.2023.02.008

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Abstract Improving the cytocompatibility of regenerated silk fibroin (RSF) biomaterials is very important to expand its application in the biomedical fields of cell culture and tissue repair. This study prepared three kinds of special nano-island-patterned RSF films by plasma etching with different etching times, and further investigated their effects on the adhesion and proliferation of NIH3T3 cells, and all quantification experiments were set at least three replicates (n≥3). The micrograph observation results after 1 d of cell culture showed that cells on the nano-pattern modified RSF films had better adhesion morphology when compared to those on the non-modified flat RSF film. The results of OD value detected by CCK-8 after 1 and 4 d of cell culture showed that nano-pattern modified RSF films significantly promoted the cell proliferation compared to the non-modified flat RSF film. Moreover, cells on the 30 min-etched film presented the highest OD value (OD=1.13±0.32), which was much higher than that of on the non-modified flat RSF film (OD=0.46±0.03, P＜0.001). In summary, plasma etching provided a simple, rapid, and large-scale nano-pattern modification strategy to improve the cytocompatibility of RSF materials, which is expected to provide important references and guidance for the surface modification of RSF and other biomaterials.

Key words： regenerated silk fibroin plasma etching nano-pattern modification cell adhesion cell proliferation

Received: 12 October 2022

PACS:

R318

Corresponding Authors: ^*E-mail: yaoxiang@dhu.edu.cn

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	Articles by authors
	Ouyang Qinjun
	Liu Xiaojiao
	Yao Xiang
	Zhang Yaopeng

Cite this article:

Ouyang Qinjun,Liu Xiaojiao,Yao Xiang, et al. Effects of Surface Nano-Pattern Modification of Regenerated Silk Fibroin Film on CellAdhesion and Proliferation[J]. Chinese Journal of Biomedical Engineering, 2023, 42(2): 201-209.

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http://cjbme.csbme.org/EN/10.3969/j.issn.0258-8021.2023.02.008 OR http://cjbme.csbme.org/EN/Y2023/V42/I2/201

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